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Multi channel chillers

Dual channel chiller or Three channel chiller for semiconductor industry

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  • There are two or more channels with the same/different specifications in one housing;
  • The temperature of two fluid channel systems can be controlled separately by one host;
  • One power supply system realizes the temperature control of 2 channels, reducing the wiring work time;
  • By controlling the variable frequency compressor, variable frequency fan, and electronic expansion valve at the same time, it can still maintain good temperature stability when the heat load fluctuates;
  • Use a pump without mechanical seal. There is no need to regularly check the pump for leakage and replace the mechanical seal.

Dual channel chillers
Three channel chillers
ETCU Heat exchange chillers
МодельFLTZ-203W-2T
Pipelinechannel 1channel 2
Диапазон температур -20℃~+90℃ -20℃~+90℃
Мощность охлаждения4kW@-10℃4kW@-10℃
Мощность нагрева2 кВт2 кВт
Heat conducting medium flow rate20L/min@0.5MPa20L/min@0.5MPa
Heat conducting medium connection sizeZG3/4ZG3/4
Ambient temperature10~35℃10~35℃
Ambient humidity30~70%30~70%
Температура охлаждающей воды15~20℃15~20℃
Cooling water flow rate20 л/мин20 л/мин
Автоматический выключатель30A
Вес400 кг
Размер см500*900*1600
Контроль температуры процессаThe remote target temperature can be controlled by combining the self created model free self built tree algorithm and cascade algorithm

МодельFLTZ-406W/ETCU-015W
Pipelinechannel 1channel 2
Диапазон температур -45℃~+40℃+10℃~+80℃
Мощность охлаждения11kW@-20℃
5kW@-40℃
13kW@+10℃
Мощность нагрева2 кВт6 кВт
Heat conducting medium flow rate17L/min@0.7MPa17L/min@0.7MPa
Heat conducting medium connection sizeZG3/4ZG3/4
Ambient temperature10~35℃10~35℃
Ambient humidity30~70%30~70%
Температура охлаждающей воды15~20℃15~20℃
Cooling water flow rate40L/min20 л/мин
Автоматический выключатель80A
Вес550kg
Размер см600*1000*1850
Контроль температуры процессаThe remote target temperature can be controlled by combining the self created model free self built tree algorithm and cascade algorithm

МодельFLTZ-203W/ETCU-008W
Pipelinechannel 1channel 2channel 3
Диапазон температур -10℃~+60℃+30℃~+80℃-10℃~+80℃
Мощность охлаждения4kW@-10℃/21kW@+20℃6 kW@+30℃3kW@-10℃
Мощность нагрева4 кВт4.5+6kW3 кВт
Heat conducting medium flow rate17L/min@0.7MPa17L/min@0.7MPa17L/min@0.7MPa
Heat conducting medium connection sizeZG3/4ZG3/4ZG3/4
Ambient temperature10~35 ℃10~35 ℃10~35 ℃
Ambient humidity30~70%30~70%30~70%
Cooling water flow rate15~20℃15~20℃15~20℃
Температура охлаждающей воды30L/min@15~20℃15L/min@15~20℃15L/min@15~20℃
Автоматический выключатель100A
Вес600kg
Размер см600*1000*1700
Контроль температуры процессаThe remote target temperature can be controlled by combining the self created model free self built tree algorithm and cascade algorithm

МодельFLTZ-203W/2T dual systemFLTZ-305W/2T  dual systemFLTZ-406W/2T dual system
Диапазон температур-20℃~90℃ -30℃~90℃-45℃~90℃
Heat conducting medium flow rate15~45l/min 6bar max
Мощность нагрева2,5 кВт2,5 кВт2,5 кВт2,5 кВт3,5 кВт3,5 кВт
Мощность охлаждения3kW at-15℃3kW at-15℃5kW at-15℃5kW at-15℃2.5kW at -35℃2.5kW at -35℃
Объем жидкости внутренней циркуляции5L5L8L8L8L8L
Объем расширительного бака15L25L25L
Heat-conducting mediumFluorinated liquid, antifreeze, thermal conductive silicone oil, etc
ХладагентR404A/ R448
Heat-conducting medium interfaceZG3/4
Интерфейс охлаждающей водыZG3/4
Интерфейс охлаждающей воды50L/min at20℃600L/min at20℃50L/min at20℃
МощностьThree phase 220V/Three phase 400V/Three phase 460V
Контроль температуры процессаУдаленная температура цели может быть контролируется путем объединения самостоятельно созданной модели бесплатно себя
algorithm and cascade algorithm

МодельFLT-215W/ETCU-015W/ETCU-008W
Pipelinechannel 1channel 2channel 3
Диапазон температур-20℃~+50℃+30℃~+100℃+30℃~+40℃
Мощность охлаждения15kW@-10℃13kW@PCW+15℃8kW@PCW+10℃
Мощность нагрева2 кВт6 кВтPump Heat Loss
Heat conducting medium flow rate30L/min@0.85MPa30L/min@0.85MPa20L/min@0.8MPa
Heat conducting medium connection sizeZG3/4ZG3/4ZG3/4
Ambient temperature10~35 ℃10~35 ℃10~35 ℃
Ambient humidity30~70%30~70%30~70%
Cooling water flow rate15~20℃15~20℃15~20℃
Температура охлаждающей воды30L/min@15~20℃15L/min@15~20℃15L/min@15~20℃
Автоматический выключатель75A
Вес600kg
Размер см600*1000*1700
Контроль температуры процессаThe remote target temperature can be controlled by combining the self created model free self built tree algorithm and cascade algorithm

МодельETCU-005WETCU-015WETCU-030WETCU-050WETCU-100WETCU-200WETCU-300W
Диапазон температурТемпература охлаждающей воды +5℃~90℃
Точность контроля температуры±0,05℃(Установившаяся температура на выходе)
Температура охлаждающей воды7℃~30℃ Cooling water flow is controlled by Siemens/Honeywell regulating valves
Мощность охлаждения5 кВт15 кВт30 кВт50 кВт100 кВт200 кВт300 кВт
Условия испытания: При максимальном объеме циркуляции разница температур между
температура контроля температуры и температура охлаждающей воды составляет 15℃
Циркуляционный насос7~20 л/мин 5 бар15~40 л/мин 5 бар20~60 л/мин 5 бар40~110 л/мин 5 бар150~250 л/мин 5 бар250~500 л/мин 5 бар400~650 л/мин 5 бар
Объем резервуара5L10L20L30L60L120L240L
Размер см480*750*390480*750*390480*750*500НастройкаНастройкаНастройкаНастройка
Контроль температуры процессаУдаленная температура цели может быть контролируется путем объединения самостоятельно созданной модели бесплатно себя
 построенный алгоритм дерева и каскадный алгоритм

FLTZ multi-channel chillers are widely used in the semiconductor industry due to their advantages such as precise temperature control, independent circuit management, and rapid cooling. The application scenarios of semiconductor chillers include wafer manufacturing, packaging testing, photolithography, etching, CVD/PVD deposition, cleaning processes, etc.

Ion implantation

The high-energy particle beam generated during ion implantation can cause local high temperatures. The process chiller can quickly remove heat to prevent thermal damage to the wafer.

Etching

During plasma etching (RIE, ICP, etc.), the chamber and electrodes need to be strictly temperature controlled to ensure etching uniformity. The chiller can provide a stable temperature environment for etching equipment and reduce process deviations

Chip packaging

In the packaging process of BGA, CSP, FCBGA, etc., the temperature control of welding and packaging materials affects reliability

PVD/CVD

CVD (such as LPCVD, PECVD) and PVD (such as sputtering coating) are used for thin film deposition, and the temperature control of the chamber and substrate affects the quality of the film.

Photolithography

The exposure system, optical lenses, laser light sources, and mask plates of the photolithography machine require precise temperature control to ensure pattern accuracy.

Wet cleaning

Used to help maintain deionized water within a specific temperature range to remove photoresist residues, metal contamination and particulate matter.

If you need independent temperature control for multiple different equipment or processes, and don’t want to buy multiple independent chillers, then FLTZ multi-channel chillers are a very ideal choice.

With the help of the Internet, we have built a global consulting, sales and service network. We have served more than 30,000 customers worldwide and have more than 90 patents.

Our chillers have been selected by more than 100 university laboratory projects around the world and exported to more than 20 countries. We have agents in various European countries and regions such as Singapore, Malaysia, Japan, South Korea, Qatar, Middle Eastern countries, Australia, the Netherlands, Spain and the United States.

We can customize it for you. For example, cooling capacity, power supply, size
We can customize the voltage and phase of the chiller according to your needs.

Generally, our multi-channel water dispenser for you includes two types: dual channel and triple channel,
If you have other channel requirements, you can contact us for customization.

LNEYA not only provides temperature control systems for semiconductor chillers, but also offers gas coolers for testing in downstream processes, and even provides temperature chambers.

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